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Photoresist develop and strip solvent compositions and method for their use

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Simple environmentally friendly developers and strippers are disclosed for free radical-initiated addition polymerizable resists cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol optionally also including a minor amount of methanol ethanol isopropyl alcohol propylene glycol monomethylacetate ethylene glycol monomethyl ether formamide nitromethane propylene oxide or methyl ethyl ketone acetone and water.

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