Nickel oxide (NiO) films have been deposited by sputtering thermal evaporation chemical vapor deposition pulsed laser deposition or electrochemical deposition which require either a high vacuum chamber or high energy consuming procedures and have limitations in substrate selection. Similarly nickel (Ni) films have been deposited by sputtering pulsed laser deposition and atomic layer deposition which require either a high vacuum chamber or have limitations in substrate selection. To help solve these challenges researchers at Berkeley have successfully demonstrated new techniques for producing NiO nanoparticle solutions under ambient conditions. Early results suggest promising microstructural and electrical characteristics. The new compositions and structures may have broad applications from advanced semiconductor products to energy production and storage. Applications: 1) Optoelectronics 2) Organic photovoltaics (OPVs) 3) Organic LEDs (OLEDs) 4) Transparent electrodes 5) Sensors 6) Batteries 7) Fuel cells 8) Electrochromics 9) Resistive memory
1) Enables attractive low-cost printable nanoparticle \"inks\"" 2) Leverages industry standard microfabrication and nanofilm platforms 3) Scalable with controlled thickness and geometry parameters 4) Tunable concentration and precisely controlled morphologies"