While photolithography has enabled the development of microelectromechanical systems (MEMS) and other \"micro machines\"" the extremely high-cost of producing such structures has limited further advances. The lab of Teri Odom has addressed these limitations by using GaN-based LEDs in place of inefficient and expensive Hg-vapor lamps for solid-state photolithography. This advance substantially lowers both the up-front cost of the equipment as well as the operational costs associated with maintaining and powering these systems. The Odom group has shown that this benchtop photolithography system can produce patterns as small as 200 nm over 4 in. Si wafers in a single exposure and has already used this technology to create a multitude of patterns and devices."
1) Substantially lower costs compared to currently available photolithography systems 2) Compact and portable 3) Does not require the use of clean-room facilities 4) Readily scalable